Nano-Fabrication (Fundamental Principles)

EOP-533

This course is an introduction to the state-of-the-art device semiconductor fabrication and thin film technology.  It is intended for scientists and engineers who are new to the field of micro and nanofabrication, as well as beginning graduate students or senior undergraduate students who will be designing and building devices in a cleanroom as part of their academic research. It is based on over 20 years of experience in research and teaching, as well as building, maintaining and operating a fully functional nanofabrication cleanroom.

Topics

  • Cleanrooms for device fabrication
  • Fundamentals of Vacuum
  • Fundamentals of Plasms for Device Fabrication
  • Physical and Chemical Vapor Deposition
  • Substrate Materials
  • Thin film deposition techniques
  • Lithography
  • Wet Chemical Etching
  • Plasma Etching
  • Doping, Surface Modification and Metal Contacts
  • Micro-metrology

Reference Text

Andrew Sarangan, “Nanofabrication: Principles to Laboratory Practice“, CRC Press, 2016.